Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM-Reference-Cited by-同舟云学术

Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM

Published:2020-08 Issue:8 Volume:27 Page:083507
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Park Seolhye¹^ORCID,Jang Yongsuk¹,Cha Taewon¹,Noh Yeongil¹,Choi Younghoon¹,Lee Juyoung¹,Seong Jaegu¹^ORCID,Kim Byungsoo¹,Cho Taeyoung¹,Park Yoona¹,Seo Rabul¹,Yang Jae-Ho¹,Kim Gon-Ho²

Affiliation:

1. Samsung Display Co. Ltd, Asan-si, Chungcheongnam-do 31454, South Korea

2. Department of Nuclear Engineering, Seoul National University, 151-741 Seoul, South Korea

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5135312

Reference15 articles.

1. New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes

2. Radical surface interactions in industrial silicon plasma etch reactors

3. Application of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing

4. Plasma etching: principles, mechanisms, application to micro- and nano-technologies

5. Synthesis and characterization of Ni–Al2O3 composite coatings containing different forms of alumina

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