Role of atomic oxygen produced by an electron cyclotron resonance plasma in the oxidation of YBa2Cu3O7−xthin films studied byinsituresistivity measurement-Reference-Cited by-同舟云学术

Role of atomic oxygen produced by an electron cyclotron resonance plasma in the oxidation of YBa2Cu3O7−xthin films studied byinsituresistivity measurement

Published:1990-10-29 Issue:18 Volume:57 Page:1936-1938
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Yamamoto K.,Lairson B. M.,Eom C. B.,Hammond R. H.,Bravman J. C.,Geballe T. H.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.104147

Reference11 articles.

1. Insitugrown YBa2Cu3O7−dthin films from single‐target magnetron sputtering

2. Preparation of Y‐Ba‐Cu oxide superconductor thin films using pulsed laser evaporation from highTcbulk material

3. In situ growth of superconducting YBaCuO using reactive electron-beam coevaporation

4. Single-Crystal YBa2Cu3O7-xThin Films by Activated Reactive Evaporation

5. Thin Film Growth of YBa2Cu3O7-xby ECR Oxygen Plasma Assisted Reactive Evaporation

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