Electric-field-driven dielectric breakdown of metal-insulator-metal hafnium silicate-Reference-Cited by-同舟云学术

Electric-field-driven dielectric breakdown of metal-insulator-metal hafnium silicate

Published:2007-12-10 Issue:24 Volume:91 Page:243514
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Lee Byoung Hun,Kang Chang Yong,Kirsch Paul,Heh Dawei,Young Chadwin D.,Park Hongbae,Yang Jiwoon,Bersuker Gennadi,Krishnan Siddarth,Choi Rino,Lee Hi-Deok

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2825288

Reference12 articles.

1. Validity of constant voltage stress based reliability assessment of high-/spl kappa/ devices

2. Hot carrier degradation of HfSiON gate dielectrics with TiN electrode

3. A Novel Bias Temperature Instability Characterization Methodology for High-$k$nMOSFETs

4. Electrical characterization and analysis techniques for the high-κ era

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