One-dimensional time-dependent fluid model of a very high density low-pressure inductively coupled plasma
Author:
Affiliation:
1. Applied Physics Department, California Institute of Technology, Pasadena, California 91125, USA
Funder
National Science Foundation (NSF)
U.S. Department of Energy (DOE)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/am-pdf/10.1063/1.4938490
Reference28 articles.
1. M. A. Lieberman and A. J. Lichtenberg , Principles of Plasma Discharges and Materials Processing, 2nd edn. ( Wiley-Interscience, Hoboken, NJ, 2005).
2. Pulsed high-density plasmas for advanced dry etching processes
3. Spatially averaged (global) model of time modulated high density argon plasmas
4. Effect of multistep ionizations on the electron temperature in an argon inductively coupled plasma
5. Pulsed-power plasma reactors: two-dimensional electropositive discharge simulation in a GEC reference cell
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