Low temperature formation of Si(111)7×7 surfaces from chemically prepared H/Si(111)‐(1×1) surfaces
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.111288
Reference24 articles.
1. The Evolution of Silicon Wafer Cleaning Technology
2. Effects of Certain Chemical Treatments and Ambient Atmospheres on Surface Properties of Silicon
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5. Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology
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