Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4837335
Reference25 articles.
1. Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond
2. High performance La/B4C multilayer mirrors with barrier layers for the next generation lithography
3. Multilayer X-ray mirrors based on La/B4C and La/B9C
4. Spectral properties of La/B - based multilayer mirrors near the boron K absorption edge
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