Relationship between secondary defects and electrical activation in ion‐implanted, rapidly annealed GaAs
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96754
Reference13 articles.
1. The electrical characteristics of ion implanted compound semiconductors
2. Ion implantation in III–V compounds
3. Annealing of selenium‐implanted GaAs
4. Infrared rapid thermal annealing of Si‐implanted GaAs
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2. MeV Al + and Al 2 + ions implantation in Si(100): surface roughness and defects in the bulk;Applied Physics A: Materials Science & Processing;2000-04-01
3. Component Evaporation, Defect Annealing, and Impurity Diffusion in the III–V Semiconductors;Rapid Thermal Processing of Semiconductors;1997
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5. Dry etching and implantation characteristics of Al0.5Ga0.5P;Applied Physics Letters;1994-05-02
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