A quantitative study of oxygen behavior during CrSi2and TiSi2formation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.343143
Reference22 articles.
1. Kinetics of TiSi2formation by thin Ti films on Si
2. Kinetics of WSi2 formation at low and high temperatures
3. Formation of vanadium silicides by the interactions of V with bare and oxidized Si wafers
4. Titanium silicide formation: Effect of oxygen distribution in the metal film
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