Comparison of electron sources for high‐resolution Auger spectroscopy in an SEM-Reference-Cited by-同舟云学术

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Comparison of electron sources for high‐resolution Auger spectroscopy in an SEM

Published:1976-12 Issue:12 Volume:47 Page:5464-5466
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:

Author:

Christou A.¹

Affiliation:

1. Naval Research Laboratory, Washington, D. C. 20375

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference14 articles.

1. N. C. MacDonald and J. R. Waldrop, Appl. Phys. Lett. 19, 315 (1971).APPLAB0003-6951

2. N. C. MacDonald, Scanning Electron Microscopy 1971, edited by Om Johari (IIT Research Institute, Chicago, 1971), p. 89.

3. W. R. Bottoms, Scanning Electron Microscopy 1972, edited by Om Johari (IIT Research Institute, Chicago, 1972), p. 182.

4. A. Christou, Scanning Electron Microscopy 1975, edited by Om Johari (IIT Research Institute, Chicago, 1975), p. 149.

5. E. K. Brandis, F. W. Anderson, and R. Hoover, in Ref. 2, p. 505.

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1. Effect of backscattered electrons on the analysis area in scanning Auger microscopy;Applied Surface Science;2004-05

2. Auger Spectroscopy;digital Encyclopedia of Applied Physics;2003-04-15

3. Metal Contact Degradation on III–V Compound Semiconductors;Semiconductor Device Reliability;1990

4. SCANNING AUGER MICROANALYSIS AT HIGH ENERGY PROBES;Le Journal de Physique Colloques;1984-02

5. Amorphous thin film diffusion barriers on GaAs and InP;Thin Solid Films;1983-06

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