Diffusion of Sb, Ga, Ge, and (As) in TiSi2
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.340399
Reference25 articles.
1. Mobility of Pd and Si inPd2Si
2. Kinetics of formation of silicides: A review
3. Diffusion of ion‐implanted As in TiSi2
4. Boron, phosphorus, and arsenic diffusion in TiSi2
5. Metastable phase formation in titanium‐silicon thin films
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