Electron transport properties of thin copper films. I.
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.321934
Reference14 articles.
1. The mean free path of electrons in metals
2. Hall-Effekts- und Leitf�higkeitsmessungen an d�nnen Kaliumschichten
3. On the Measurement of Electric Constants of Thin Metallic Films
4. Hall Effect in Thin Metal Films
5. Hall coefficient in vacuum-deposited copper films
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