Ion energy analysis for sputtering‐type electron‐cyclotron‐resonance microwave plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.342534
Reference6 articles.
1. Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma
2. Low‐energy ion extraction with small dispersion from an electron cyclotron resonance microwave plasma stream
3. Magnetic field gradient effects on ion energy for electron cyclotron resonance microwave plasma stream
4. Electron Cyclotron Resonance Plasma Deposition Technique Using Raw Material Supply by Sputtering
5. Microwave Plasma Etching
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