Si/SiO2etch properties using CF4and CHF3in radio frequency cylindrical magnetron discharges
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.103322
Reference17 articles.
1. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition
2. Plasma characterization of an electron cyclotron resonance–radio‐frequency hybrid plasma reactor
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