Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect-Reference-Cited by-同舟云学术

Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect

Published:2020-08-14 Issue:6 Volume:128 Page:065301
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Krylov Igor¹^ORCID,Korchnoy Valentina²^ORCID,Xu Xianbin³,Weinfeld Kamira⁴^ORCID,Yalon Eilam⁵^ORCID,Ritter Dan⁵,Eizenberg Moshe³⁴

Affiliation:

1. Tower Semiconductor Ltd., Ramat Gavriel Industrial Park, Migdal HaEmek 2310502, Israel

2. Micro-Nano Fabrication Unit (MNFU), Microelectronics Center, Technion—Israel Institute of Technology, Haifa 32000, Israel

3. Department of Materials Science and Engineering, Technion—Israel Institute of Technology, Haifa 32000, Israel

4. Solid State Institute, Technion—Israel Institute of Technology, Haifa 32000, Israel

5. The Andrew and Erna Viterbi Faculty of Electrical Engineering, Technion—Israel Institute of Technology, Haifa 32000, Israel

Funder

Ministry of Science, Technology and Space

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0015961

Reference52 articles.

1. Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition

2. Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications

3. High-performance TaN/HfSiON/Si metal-oxide-semiconductor structures prepared by NH3 post-deposition anneal

4. Thermally Robust HfN Metal as a Promising Gate Electrode for Advanced MOS Device Applications

5. Investigations of titanium nitride as metal gate material, elaborated by metal organic atomic layer deposition using TDMAT and NH3

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Research Trends of Atomic Layer Deposition of Metal Nitrides and Their Applications in Semiconductor Industry;Ceramist;2024-03-31

2. Charge-carrier-type controlled superconducting dome in ZrNxOy films;Physical Review Materials;2023-09-12

3. Electrical properties and thermistor behavior of TiAlN thin films deposited by combinatorial sputtering;Surface and Coatings Technology;2023-07

4. Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments;Journal of Vacuum Science & Technology A;2023-03-06

5. High‐Quality Plasmonic Materials TiN and ZnO:Al by Atomic Layer Deposition;physica status solidi (RRL) – Rapid Research Letters;2021-08-06