An inorganic anti‐reflective coating for use in photolithography
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.352855
Reference13 articles.
1. Improved Photoresist Patterning over Reflective Topographies Using Titanium Oxynitride Antireflection Coatings
2. TiNxOy as a barrier between Cr-Si-(O) and aluminium thin films
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