Author:
Pauliac-Vaujour S.,Brianceau P.,Landis S.,Chiaroni J.,Faynot O.
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Cited by
12 articles.
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1. High-resolution, high-throughput, CMOS-compatible electron-beam patterning;SPIE Proceedings;2017-03-27
2. Mask registration and lithography platform portability for nitride fin-based field effect transistors prototyping;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11
3. Metallic colour filtering arrays manufactured by NanoImprint lithography;Microelectronic Engineering;2013-11
4. Capped carbon hard mask and trimming process: A low-cost and efficient route to nanoscale devices;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-03
5. Plasma Cleaning for Electronic, Photonic, Biological, and Archeological Applications;Developments in Surface Contamination and Cleaning;2013