Effect of nitrogen ion bombardment on defect formation and luminescence efficiency of GaNP epilayers grown by molecular-beam epitaxy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2182028
Reference21 articles.
1. GaN0.011P0.989 red light-emitting diodes directly grown on GaP substrates
2. Control of structural defects in group III V N alloys grown on Si
3. Luminescence quenching and the formation of the GaP1−xNxalloy in GaP with increasing nitrogen content
4. Composition dependence of interband transition intensities in GaPN, GaAsN, and GaPAs alloys
5. Nature of the fundamental band gap in GaNxP1−x alloys
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1. Dual-wavelength excited photoluminescence spectroscopy of deep-level hole traps in Ga(In)NP;Journal of Applied Physics;2015-01-07
2. Growth and luminescence characterization of dilute InPN alloys grown by molecular beam epitaxy;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-05
3. Evidence for a phosphorus-related interfacial defect complex at a GaP/GaNP heterojunction;Physical Review B;2010-03-31
4. Dominant recombination centers in Ga(In)NAs alloys: Ga interstitials;Applied Physics Letters;2009-12-14
5. Doping control and evaluation of pn-junction LED in GaPN grown by OMVPE;Journal of Crystal Growth;2008-11
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