Laser ablation of polymethylmethacrylate and polystyrene at 308 nm: Demonstration of thermal and photothermal mechanisms by a time‐of‐flight mass spectroscopic study-Reference-Cited by-同舟云学术

Laser ablation of polymethylmethacrylate and polystyrene at 308 nm: Demonstration of thermal and photothermal mechanisms by a time‐of‐flight mass spectroscopic study

Published:1994-11 Issue:9 Volume:76 Page:5598-5600
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Tsunekawa Makoto,Nishio Satoru,Sato Hiroyasu

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.358487

Reference14 articles.

1. Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laser

2. Deep uv submicron lithography by using a pulsed high‐power excimer laser

3. Self‐developing photoetching of poly(ethylene terephthalate) films by far‐ultraviolet excimer laser radiation

4. Ablative photodecomposition: action of far-ultraviolet (193 nm) laser radiation on poly(ethylene terephthalate) films

5. Ultraviolet laser ablation of organic polymers

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