Frequency-dependent failure mechanisms of nanocrystalline gold interconnect lines under general alternating current-Reference-Cited by-同舟云学术

Frequency-dependent failure mechanisms of nanocrystalline gold interconnect lines under general alternating current

Published:2014-09-14 Issue:10 Volume:116 Page:103509
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Luo X. M.¹,Zhang B.²,Zhang G. P.¹

Affiliation:

1. Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016, People's Republic of China

2. Key Laboratory for Anisotropy and Texture of Materials (Ministry of Education), School of Materials and Metallurgy, Northeastern University, 3-11 Wenhua Road, Shenyang 110819, People's Republic of China

Funder

National Basic Research Program of China

National Natural Science Foundation of China (NSFC)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4894825

Reference56 articles.

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2. Thermal fatigue testing of thin metal films

3. Electromigration in ULSI interconnects

4. Synergistic combinations of dielectrics and metallization process technology to achieve 22nm interconnect performance targets

5. The future of interconnection technology

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