Formation of metallic, crystalline NiSi2thin film on amorphous SiO2/Si
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.352843
Reference10 articles.
1. Electrical transport properties of CoSi2and NiSi2thin films
2. A Review of Silicon-On-Insulator Formation by Oxygen Ion Implantation
3. Optimized conditions for the formation of buried insulating layers in Si by high dose implantation of oxygen
4. Reduced defect density in silicon‐on‐insulator structures formed by oxygen implantation in two steps
5. Chemical and electronic structure of the SiO2/Si interface
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Growth of Crystalline Quality Sic on Thin and Thick Silicon-on-Insulator Structures;MRS Proceedings;1996
2. CVD Growth of SiC on Ultrathin SOi2: A Step Towards Development of a Compliant Substrate for SiC and III-V Compounds;MRS Proceedings;1995
3. Microstructural analysis of nickel silicide formed by nickel/silicon‐on‐oxide annealing;Applied Physics Letters;1993-05-24
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