Design and fabrication of robust broadband extreme ultraviolet multilayers-Reference-Cited by-同舟云学术

Design and fabrication of robust broadband extreme ultraviolet multilayers

Published:2019-04 Issue:4 Volume:9 Page:045027
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Kuang Shang-qi¹,Wang Jian-bo¹,Yang Hai-gui²,Huo Tong-lin³,Zhou Hong-jun³

Affiliation:

1. School of Science, Changchun University of Science and Technology, Changchun 130022, China

2. Advanced Manufacturing Technology for Optical Systems Laboratory, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China

3. Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China

Funder

Jilin Scientific and Technological Development Plan

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5057714

Reference24 articles.

1. Nanometer interface and materials control for multilayer EUV-optical applications

2. Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

3. Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

4. Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics

5. Design and fabrication of broadband EUV multilayer mirrors

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