Calculated moments for the implantation of boron into silicides
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.337677
Reference9 articles.
1. One‐Micron Polycide (WSi2 on Poly‐Si) MOSFET Technology
2. Electrical Properties of Composite Evaporated Silicide/Polysilicon Electrodes
3. The Effect of Implantation of Phosphorus into Sputtered MoSi2 Thin Films
4. Refractory metal silicides: Thin-film properties and processing technology
5. A Monte Carlo computer program for the transport of energetic ions in amorphous targets
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