Sputtering of Single‐Crystal Copper and Aluminum with 20–600 eV Argon Ions
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1703109
Reference17 articles.
1. Low-Energy Sputtering Yields in Hg
2. Sputtering Yields at Very Low Bombarding Ion Energies
3. Full‐Plane Threshold Energies for Cathode Sputtering of Metals with Ar+ Ions
4. Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 ev
Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Surface Morphology and Sputtering Mechanism of Etched Areas of a Metallic Target by Magnetron Sputtering;Journal of Electronic Materials;2021-02-05
2. The Influence of Low-Energy Ion-Plasma Treatment on the Surface Morphology of Pt Films with Varying Strength of Crystalline Texture;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2020-07
3. On the use of rhodium mirrors for optical diagnostics in ITER;Fusion Engineering and Design;2019-09
4. A lithium depth-marker technique for rapid erosion and deposition measurements;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2014-01
5. Theoretical sputtering yields of Al and Mg targets in physical vapor deposition processes;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2001-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3