Theoretical sputtering yields of Al and Mg targets in physical vapor deposition processes-Reference-Cited by-同舟云学术

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Theoretical sputtering yields of Al and Mg targets in physical vapor deposition processes

Published:2001-05 Issue:3 Volume:19 Page:805-811
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Bordes J. M.,Bordes Ch.,Ehret E.,Gschwind R.,Bauer Ph.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1365139

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of Plasma Treatment on Surface Characteristics of Aluminum Alloy Sheets and Bonding Performance of Glass Fiber-Reinforced Thermoplastic/Al Composites;Materials;2023-04-23

2. Surface chemistry and composition-induced variation of laser interference-based surface treatment of Al alloys;Applied Surface Science;2019-09

3. Discrete-path transport theory of physical sputtering;Journal of Applied Physics;2002-08

4. Depth of origin of sputtered atoms for elemental Al and Mg targets in physical vapor deposition processes;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2001-05

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