Pulsed-laser deposition of high-k titanium silicate thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2039274
Reference51 articles.
1. Semiconductor Industry Association,2003
2. High-κ gate dielectrics: Current status and materials properties considerations
3. Electrical characterisation and reliability of HfO2 and Al2O3–HfO2 MIM capacitors
4. Rutile-type TiO2 thin film for high-k gate insulator
5. Electrical properties of thin film zirconia grown by ultraviolet ozone oxidation
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