Two-dimensional van der Waals ferroelectric field-effect transistors toward nonvolatile memory and neuromorphic computing

Author:

Lin Xiankai12ORCID,Huang Xuguang1ORCID,Zhang Qian3ORCID,Yi Jianxian23ORCID,Liu Shenghua3ORCID,Liang Qijie2ORCID

Affiliation:

1. School of Information and Optoelectronic Science and Engineering SCNU, South China Normal University 1 , Guangzhou 510631, China

2. Songshan Lake Materials Laboratory, Songshan Lake Mat Lab 2 , Dongguan 523808, China

3. School of Materials, Shenzhen Campus of Sun Yat-sen University 3 , No. 66, Gongchang Road, Guangming District, Shenzhen 518107, China

Abstract

With the gradual decline in Moore's law, traditional silicon-based technologies have encountered numerous challenges and limitations, prompting researchers to seek solutions. Two-dimensional (2D) van der Waals (vdWs) ferroelectric (Fe) field-effect transistors (FETs) (2D vdWs FeFETs) are devices that integrate emerging 2D vdWs ferroelectric materials into the transistor structures. In comparison with traditional complementary metal oxide semiconductor FETs (COMSFETs), they exhibit superior performance, including lower power consumption, higher switching speed, and improved stability. The vdWs FeFETs are anticipated to surpass the limits imposed by Moore's law, offering increased possibilities and opportunities for research and application in the field of nanoelectronics, particularly in nonvolatile memory (NVM) and neuromorphic computing (NMC). In this review, we summarize the recent research progress of vdWs FeFETs and elucidate their development origin, basic structure, and working mechanism. Furthermore, we explore the application of vdWs FeFETs in NVM, NMC, and large-scale arrays. Finally, we highlight the prominent challenges and future directions in this field.

Funder

National Natural Science Foundation of China

Basic and Applied Basic Research Foundation of Guangdong Province

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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