Subject
General Physics and Astronomy
Reference33 articles.
1. Scaling the gate dielectric: Materials, integration, and reliability
2. X. Huang ,
W.C. Lee ,
C. Kuo ,
D. Hisamoto ,
L. Chang ,
J. Kedzierski ,
E. Anderson ,
H. Takeuchi ,
Y.K. Choi , and
K. Asano , in Proceedings of the Sub 50-nm finfet: Pmos (
IEEE,
Washington, 1999), p. 67.
3. (Invited) Past, Present and Future: SiGe and CMOS Transistor Scaling
4. Thin film reaction of transition metals with germanium
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