Stress in ion‐implanted CVD Si3N4films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.324217
Reference11 articles.
1. Silicon Nitride Thin Films from SiCl[sub 4] Plus NH[sub 3]: Preparation and Properties
2. Some Properties of Vapor Deposited Silicon Nitride Films Using the SiH[sub 4]-NH[sub 3]-H[sub 2] System
3. Absorption edge and ion bombardment of silicon nitride
4. Quantitative Detection of Oxygen in Silicon Nitride on Silicon
5. Compaction of ion‐implanted fused silica
Cited by 64 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of angular position on the quality of dense plasma focus-based additive layer manufactured molybdenum coatings;The International Journal of Advanced Manufacturing Technology;2018-09-13
2. Structural, Morphological and Mechanical Characterisation of Molybdenum Nitride Thin Films Deposited by a Plasma Focus Device;Journal of Chemical Research;2017-12
3. Plasma focus method for growth of molybdenum nitride thin films: Synthesis and thin film characterization;Journal of Alloys and Compounds;2017-12
4. Microstructure, Surface Morphology and Photoluminescence Properties of Al-Doped ZnO Thin Films Prepared by Plasma Focus Method;Journal of Inorganic and Organometallic Polymers and Materials;2016-09-23
5. Ion induced bending (IIB) phenomenon for 3-D structure fabrication;Surface and Coatings Technology;2011-11
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3