Molecular‐beam‐epitaxy growth of GaN on GaAs(100) by using reactive nitrogen source

Author:

He Z. Q.,Ding X. M.,Hou X. Y.,Wang Xun

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 54 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Raman scattering study on dilute nitride-bismide GaNAsBi alloys: behavior of photo-excited LO phonon-plasmon coupled mode;Japanese Journal of Applied Physics;2023-01-01

2. Status of high current H2+ and H3+ ion sources;Review of Scientific Instruments;2019-10-01

3. Cubic GaN films grown below the congruent sublimation temperature of (0 0 1) GaAs substrates by plasma-assisted molecular beam epitaxy;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-03

4. Growth of p-type ZnTe thin films by using nitrogen doping during pulsed laser deposition;Journal of the Korean Physical Society;2015-08

5. Preparation of Spherical GaN:Zn Phosphors by Aerosol Pyrolysis for FED Applications;Journal of The Electrochemical Society;2006

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