New model for dopant redistribution at interfaces
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.102210
Reference4 articles.
1. VLSI Process modeling—SUPREM III
2. Intracavity cw difference frequency generation by mixing three photons and using Gaussian laser beams
3. Analysis of polycrystalline silicon diffusion sources by secondary ion mass spectrometry
4. Simulation of critical IC fabrication processes using advanced physical and numerical methods
Cited by 26 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Process Simulation;Springer Handbook of Semiconductor Devices;2022-11-11
2. Density-functional study on the dopant-segregation mechanism: Chemical potential dependence of dopant-defect complex at Si/SiO2 interface;Journal of Applied Physics;2018-04-28
3. Diffusion and Segregation Model for the Annealing of Silicon Solar Cells Implanted With Phosphorus;IEEE Journal of Photovoltaics;2015-01
4. Role of Defects in the Dopant Diffusion in Si;Semiconductors and Semimetals;2015
5. A first-principles study of As doping at a disordered Si–SiO2interface;Journal of Physics: Condensed Matter;2013-12-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3