Bonding properties and their relation to residual stress and refractive index of amorphous Ta(N,O) films investigated by x-ray absorption spectroscopy-Reference-Cited by-同舟云学术

Bonding properties and their relation to residual stress and refractive index of amorphous Ta(N,O) films investigated by x-ray absorption spectroscopy

Published:2005-04-18 Issue:16 Volume:86 Page:161910
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Jan J. C.,Babu P. D.,Tsai H. M.,Pao C. W.,Chiou J. W.,Ray S. C.,Kumar K. P. Krishna,Pong W. F.,Tsai M.-H.,Jong C. A.,Chin T. S.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1905784

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1. Evaluating the Large Electromigration Resistance of Copper Interconnects Employing a Newly Developed Accelerated Life‐Test Method

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5. Effects of oxygen in TiNxon the diffusion of Cu in Cu/TiN/Al and Cu/TiNx/Si structures

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