Forevacuum plasma-cathode electron source for generation of a ribbon beam over a wide pressure range

Author:

Klimov A. S.1ORCID,Bakeev I. Yu.1ORCID,Burachevsky Yu. A.1,Dagri J. E.1ORCID,Oks E. M.12ORCID,Zenin A. A.1ORCID

Affiliation:

1. Laboratory of Plasma Electronics, Tomsk State University of Control Systems and Radioelectronics 1 , 634050 Tomsk, Russia

2. Laboratory of Plasma Sources, Institute of High Current Electronics SB RAS 2 , 634034 Tomsk, Russia

Abstract

We describe the results of our investigations of the generation of a ribbon electron beam (10 × 220 mm2) by a two-stage discharge system based on a hollow-cathode glow discharge plasma. The source design enables operation in the pressure range 2 × 10−2 to 10 Pa. At a beam accelerating voltage of 8 kV, the beam current is 450 mA at a pressure of 2 × 10−2 Pa and 150 mA at a pressure of 10 Pa. To achieve a uniform current density distribution of the beam over its cross-sectional area, a special design of emission electrode was employed. This enabled us to reduce non-uniformities of the beam current density distribution to a level of 10%.

Funder

Ministry of Science and Higher Education of the Russian Federation

Publisher

AIP Publishing

Subject

Instrumentation

Reference27 articles.

1. Low-temperature plasmas generated by intense electron beams

2. Plasma technologies for material processing in nanoelectronics: Problems and solutions;J. Commun. Technol. Electron.,2017

3. Electron-beam plasma for biomass modification;IEEE Trans. Plasma Sci.,2020

4. Beam–plasma discharge in space and in a lab;Plasma Phys. Rep.,2021

5. Encyclopedia of low-temperature plasma;High Temp.,2008

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3