Characterization of silicon dioxide film by high spatial resolution cathodoluminescence spectroscopy-Reference-Cited by-同舟云学术

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Characterization of silicon dioxide film by high spatial resolution cathodoluminescence spectroscopy

Published:2002-12-15 Issue:12 Volume:92 Page:7153-7156
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Yoshikawa M.,Matsuda K.,Yamaguchi Y.,Matsunobe T.,Nagasawa Y.,Fujino H.,Yamane T.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1520726

Reference17 articles.

1. The deposition of SiOF film with low dielectric constant in a helicon plasma source

2. Raman Study of Ring Structures of Chemical Vapor Deposited SiO$_{\bf 2}$ Thin Films

3. Effect of fluorine on dielectric properties of SiOF films

4. Characterization of fluorine-doped silicon dioxide film by Raman spectroscopy

5. A new intrinsic defect in amorphous SiO2: Twofold coordinated silicon

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