Electrical, structural, and chemical properties of HfO2 films formed by electron beam evaporation-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Electrical, structural, and chemical properties of HfO2 films formed by electron beam evaporation

Published:2008-09-15 Issue:6 Volume:104 Page:064113
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Cherkaoui K.,Monaghan S.,Negara M. A.,Modreanu M.,Hurley P. K.,O’Connell D.,McDonnell S.,Hughes G.,Wright S.,Barklie R. C.,Bailey P.,Noakes T. C. Q.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2978209

Reference35 articles.

1. On the scaling issues and high-κ replacement of ultrathin gate dielectrics for nanoscale MOS transistors

2. Thin-Film Transistor Fabricated in Single-Crystalline Transparent Oxide Semiconductor

3. A high performance MIM capacitor using HfO2 dielectrics

4. High dielectric constant gate oxides for metal oxide Si transistors

5. Proceedings of the IEEE Conference Electron Devices and Solid State Circuits;Zhan N.,2003

Cited by 60 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Leakage current control of Y-HfO2 for dynamic random access memory applications via ZrO2 stacking;Ceramics International;2024-07

2. Molecular Adhesion of a Pilus‐Derived Peptide Involved in Pseudomonas aeruginosa Biofilm Formation on Non‐Polar ZnO‐Surfaces;Chemistry – A European Journal;2023-11-30

3. Surface wettability, morphology and optical characteristics of HfO2 films grown systematically by electron beam evaporation;Applied Physics A;2023-02-06

4. Electrostatic Engineering of β-Ga₂O₃ Trench Metal–Insulator–Semiconductor Schottky Barrier Diodes Using a Bilayer Dielectric Stack;IEEE Transactions on Electron Devices;2022-10

5. Controlling the fixed negative charge formation in Si/high- k interfaces;Physical Review Materials;2022-09-19

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3