Novel chemical vapor deposition process of ZnO films using nonequilibrium N2 plasma generated near atmospheric pressure with small amount of O2 below 1%-Reference-Cited by-同舟云学术

Novel chemical vapor deposition process of ZnO films using nonequilibrium N2 plasma generated near atmospheric pressure with small amount of O2 below 1%

Published:2016-05-07 Issue:17 Volume:119 Page:175302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Nose Yukinori¹,Yoshimura Takeshi¹,Ashida Atsushi¹,Uehara Tsuyoshi²,Fujimura Norifumi¹^ORCID

Affiliation:

1. Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai-shi, Osaka 599-8531, Japan

2. Sekisui Chemical Co., Ltd. 2-2, Kamichoshi-cho, Kamitoba, Minami-ku, Kyoto-shi, Kyoto 601-8105, Japan

Funder

Japan Society for the Promotion of Science (JSPS)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4948326

Reference46 articles.

1. Optically pumped ultraviolet lasing from ZnO

2. High temperature excitonic stimulated emission from ZnO epitaxial layers

3. Zener Model Description of Ferromagnetism in Zinc-Blende Magnetic Semiconductors

4. Formation of two-dimensional electron gas and the magnetotransport behavior of ZnMnO/ZnO heterostructure

5. Room-temperature spin coherence in ZnO

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Helium and Oxygen Plasma Treatment on ZnO Thin Films Fabricated Using Atmospheric Cold Plasma;Journal of the Japan Society for Precision Engineering;2018

2. Nanopore diameter-dependent properties of thin three-dimensional ZnO layers deposited onto nanoporous silicon substrates;Ceramics International;2017-04

3. Low temperature formation of highly resistive ZnO films using nonequilibrium N2/O2 plasma generated near atmospheric pressure;Thin Solid Films;2016-10