Effect of oxidation on the chemical bonding structure of PECVD SiNx thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2402581
Reference30 articles.
1. LPCVD against PECVD for micromechanical applications
2. Towards MEMS-based infrared tunable microspectrometers
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4. Low temperature–low hydrogen content silicon nitrides thin films deposited by PECVD using dichlorosilane and ammonia mixtures
5. Mechanism of SiN x H y Deposition from NH 3 ‐ SiH4 Plasma
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