Improved thermal stability of ruthenium oxide metal gate electrode on hafnium oxide gate dielectric
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2766654
Reference12 articles.
1. Metal gate technology for nanoscale transistors—material selection and process integration issues
2. Fermi Pinning-Induced Thermal Instability of Metal-Gate Work Functions
3. Characterization of RuO2 electrodes on Zr silicate and ZrO2 dielectrics
4. Electrical properties of RuO2 gate electrodes for dual metal gate Si-CMOS
5. Thermally grown ruthenium oxide thin films
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