Ion‐induced radical production on surfaces during deposition of hydrogenated amorphous carbon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.346287
Reference10 articles.
1. Ion impact effect on carbon coatings studied in a double plasma device
2. Carbonization in tokamaks
3. Hydrogen retention and release dynamics of amorphous carbon films exposed to a hydrogen plasma
4. Mass spectroscopic investigation of the CH3radicals in a methane rf discharge
5. Observation of CH2radical and comparison with CH3radical in a rf methane discharge
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1. Chemical and physical sputtering effects on the surface morphology of carbon films grown by plasma chemical vapor deposition;Journal of Applied Physics;2009-08
2. Influence of external bias on the surface morphology of a-C:H films grown by electron cyclotron resonance chemical vapor deposition;Surface and Coatings Technology;2007-09
3. DC substrate bias effects on the physical properties of hydrogenated amorphous carbon films grown by plasma-assisted chemical vapour deposition;Vacuum;2007-08
4. Growth dynamics of ultrasmooth hydrogenated amorphous carbon films;Physical Review B;2006-10-13
5. Spatially resolved optical emission study of sputtering in reactive plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1998-03
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