Novel method for measuring excimer laser ablation thresholds of polymers
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.99612
Reference10 articles.
1. Self‐developing photoetching of poly(ethylene terephthalate) films by far‐ultraviolet excimer laser radiation
2. Direct etching of polymeric materials using a XeCl laser
3. Surface properties of poly(ethylene terephthalate) films modified by far-ultraviolet radiation at 193nm (laser) and 185nm (low intensity)
4. Development and origin of conical structures on XeCl laser ablated polyimide
5. Electrostatic collection of debris resulting from 193 nm laser etching of polyimide
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