Damage‐induced high‐resistivity regions in Al0.48In0.52As
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.102173
Reference16 articles.
1. GaInAs‐AlInAs structures grown by molecular beam epitaxy
2. The growth and characterization of nominally undoped Al1−xInxAs grown by molecular beam epitaxy
3. Electrical properties of undoped and Si‐doped Al0.48In0.52As grown by liquid phase epitaxy
4. Electrical and structural characterization of highly perfect semi-insulating InAlAs grown by molecular beam epitaxy
5. GaAlInAs ternary and quaternary alloys lattice matched to InP for electronic, optoelectronic and optical device applications, by LP-MOVPE
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1. Characterization of electron traps in plasma-treated AlInAs;Journal of Electronic Materials;1996-05
2. Thermal stability of Al0.48In0.52As/Ga0.47In0.53As/InP heterostructure and its improvement by phosphidization;Journal of Electronic Materials;1996-05
3. ION IMPLANTATION IN III–V SEMICONDUCTOR TECHNOLOGY;International Journal of Modern Physics B;1993-12-30
4. Formation of high resistivity regions inp‐type Al0.5In0.5P by ion implantation;Applied Physics Letters;1993-12-06
5. Fe and Ti implants in In0.52Al0.48As;Journal of Electronic Materials;1993-09
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