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Power matching to pulsed inductively coupled plasmas

Published:2020-04-07 Issue:13 Volume:127 Page:133302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Qu Chenhui¹^ORCID,Lanham Steven J.²^ORCID,Shannon Steven C.³^ORCID,Nam Sang Ki⁴,Kushner Mark J.¹^ORCID

Affiliation:

1. Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122, USA

2. Department of Chemical Engineering, University of Michigan, Ann Arbor, Michigan 48109-2136, USA

3. Department of Nuclear Engineering, North Carolina State University, Raleigh, North Carolina 27695-7909, USA

4. Mechatronics R&D Center, Samsung Electronics Co., Ltd., 1-1 Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do 18448, South Korea

Funder

National Science Foundation

U.S. Department of Energy

Samsung

Lam Research Corporation

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/am-pdf/10.1063/5.0002522

Reference39 articles.

1. Self-consistent nonlinear transmission line model of standing wave effects in a capacitive discharge

2. Magnetic induction and plasma impedance in a planar inductive discharge

3. Power Waves and the Scattering Matrix

4. Low-frequency, high-density, inductively coupled plasma sources: Operation and applications

5. Multi frequency matching for voltage waveform tailoring

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