Atypical secondary electron emission yield curves of very thin SiO2 layers: Experiments and modeling
Author:
Affiliation:
1. LAPLACE (Laboratoire Plasma et Conversion d’Energie), Université de Toulouse; CNRS UPS, INPT, 118 route de Narbonne, F-31062 Toulouse cedex 9, France
2. ONERA—The French Aerospace Laboratory, FR-31062 Toulouse cedex 4, France
Funder
SEPHIR, IDEX Actions Thematiques Strategiques - ATS 2015 - Universite de Toulouse
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0056218
Reference59 articles.
1. Self-consistent electrical charging of insulating layers and metal-insulator-semiconductor structures
2. A new examination of secondary electron yield data
3. Secondary electron emission in the scanning electron microscope
4. Secondary electron contrast in low-vacuum∕environmental scanning electron microscopy of dielectrics
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1. Experimental and Monte-Carlo study of double-hump electron emission yield curves of SiO2 thin films;Journal of Applied Physics;2023-04-04
2. Monte-Carlo simulation and experimental study of the effect of internal charging on the electron emission yield of amorphous SiO2 thin films;Journal of Electron Spectroscopy and Related Phenomena;2022-12
3. Study of the Electrical Properties of Thin Silica Layers with a Single Plane of AgNPs Embedded Near the Surface;2022 IEEE 4th International Conference on Dielectrics (ICD);2022-07-03
4. Measurement of total electron emission yield of insulators based on self-terminating charge neutralization;Review of Scientific Instruments;2022-05-01
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