Cross-section set and chemistry model for the simulation of c-C4F8 plasma discharges
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1448894
Reference36 articles.
1. Absolute density and reaction kinetics of fluorine atoms in high-density c-C4F8 plasmas
2. Highly Selective and Highly AnisotropicSiO2Etching in Pulse-Time Modulated Electron Cyclotron Resonance Plasma
3. Surface Kinetics of CFxRadicals and Fluorine Atoms in the Afterglow of High-Density C4F8Plasmas
4. Ion fluxes and energies in inductively coupled radio-frequency discharges containing C2F6 andc-C4F8
5. CF, CF2, and SiF densities in inductively driven discharges containing C2F6, C4F8, and CHF3
Cited by 81 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Construction and validation of C3F8 electron impact and heavy particle reaction scheme for modeling plasma discharges;Physics of Plasmas;2024-03-01
2. Time-varying mechanism of ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma;Japanese Journal of Applied Physics;2023-12-26
3. Effects of C4F8 plasma polymerization film on etching profiles in the Bosch process;Journal of Vacuum Science & Technology A;2023-10-02
4. Evaluation of etching performance of single etching gases for high-κ films;Microelectronic Engineering;2023-10
5. Theoretical investigations of positron collisions with phosphorus-containing compounds;Journal of Applied Physics;2023-09-26
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3