Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1629153
Reference34 articles.
1. Extreme-ultraviolet sources for lithography applications
2. Comparison of different source concepts for EUVL
3. Progress toward use of a dense plamsa focus as a light source for production EUV lithography
4. Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region
5. Xenon-emission-spectra identification in the 5–20-nm spectral region in highly ionized xenon capillary-discharge plasmas
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