Effect of repetition rate of a pulsed microwave diamond forming plasma on the density of C2
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1324722
Reference14 articles.
1. Pulse modulated electron cyclotron resonance plasma for chemical vapor deposition of diamond films
2. Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition
3. Growth of diamond in a pulsed microwave discharge
4. The effect of frequency and duty cycle of a pulsed microwave plasma on the chemical vapor deposition of diamond
5. Carbon dimer, C2, as a growth species for diamond films from methane/hydrogen/argon microwave plasmas
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1. Synthesis of carbon-encapsulated metal-based nanoparticles by gas/liquid interfacial plasma under high pressure;Journal of Environmental Chemical Engineering;2022-06
2. Imaging and Modeling C2 Radical Emissions from Microwave Plasma-Activated Methane/Hydrogen Gas Mixtures: Contributions from Chemiluminescent Reactions and Investigations of Higher-Pressure Effects and Plasma Constriction;The Journal of Physical Chemistry A;2021-05-09
3. Prediction of the electric discharge occurrence under repetitive bipolar rectangular pulsed electric field <20 kV/cm;Applied Physics Letters;2018-08-06
4. Optical Emission from C2– Anions in Microwave-Activated CH4/H2 Plasmas for Chemical Vapor Deposition of Diamond;The Journal of Physical Chemistry A;2017-04-03
5. Microwave Plasmas: Single Crystal Diamond Synthesis;Encyclopedia of Plasma Technology;2016-12-12
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