Survival of atomic monolayer steps during oxide desorption on GaAs (100)

Author:

Lee J. H.,Wang Zh. M.,Salamo G. J.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Droplet free self-assembling of high density nanoholes on GaAs(100) via thermal drilling;Journal of Crystal Growth;2024-03

2. Investigation of GaAs surface treatments for ZnSe growth by molecular beam epitaxy without a buffer layer;Applied Surface Science;2021-05

3. In situ flashes of gallium technique for oxide-free epiready GaSb (100) surface;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-03

4. Low temperature oxide desorption in GaAs (111)A substrates;Thin Solid Films;2013-06

5. Controlling structural properties of positioned quantum dots;Journal of Crystal Growth;2013-05

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