In situ flashes of gallium technique for oxide-free epiready GaSb (100) surface-Reference-Cited by-同舟云学术

In situ flashes of gallium technique for oxide-free epiready GaSb (100) surface

Published:2017-03 Issue:2 Volume:35 Page:02B114
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Mathews Sen,Schuler-Sandy Theodore,Kim Jong Su¹,Kadlec Clark,Kazemi Alireza,Dahiya Vinita,Ramirez David A.,Myers Stephen A.,Kuznetsova Yuliya V.,Krishna Sanjay²

Affiliation:

1. Department of Physics, Yeungnam University, Gyeongsan 712-749, South Korea, 38541

2. Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210; Center for High Technology Materials University of New Mexico, Albuquerque, New Mexico 87106; and SK Infrared, 801 University Blvd. SE Suite 205, Albuquerque, New Mexico 87106

Funder

Air Force Research Laboratory (AFRL)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.4978604

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