An in situ x-ray photoelectron spectroscopy study of the initial stages of rf magnetron sputter deposition of indium tin oxide on p-type Si substrate-Reference-Cited by-同舟云学术

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An in situ x-ray photoelectron spectroscopy study of the initial stages of rf magnetron sputter deposition of indium tin oxide on p-type Si substrate

Published:2013-01-14 Issue:2 Volume:102 Page:021606
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Rein M. H.,Hohmann M. V.,Thøgersen A.,Mayandi J.,Holt A. O.,Klein A.,Monakhov E. V.

Funder

Deutsche Forschungsgemeinschaft

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4774404

Reference25 articles.

1. Properties of tin doped indium oxide thin films prepared by magnetron sputtering

2. Interfacial stability of an indium tin oxide thin film deposited on Si and Si0.85Ge0.15

3. The operation of the semiconductor‐insulator‐semiconductor solar cell: Experiment

4. Thermal degradation of indium‐tin‐oxide/p‐silicon solar cells

5. Characterization of thin and ultrathin transparent conducting oxide (TCO) films and TCO-Si interfaces with XPS, TEM and ab initio modeling

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