Charge trapping related threshold voltage instabilities in high permittivity gate dielectric stacks
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1570933
Reference14 articles.
1. Quantum-mechanical modeling of electron tunneling current from the inversion layer of ultra-thin-oxide nMOSFET's
2. Ultimate limit for defect generation in ultra-thin silicon dioxide
3. High-κ gate dielectrics: Current status and materials properties considerations
4. Measurement of barrier heights in high permittivity gate dielectric films
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