Structural characterization of thin GaN epilayers directly grown on on-axis 6H–SiC(0001) by plasma-assisted molecular beam epitaxy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.122920
Reference16 articles.
1. Growth and Properties of III-V Nitride Films, Quantum Well Structures and Integrated Heterostructure Devices
2. Issues and Examples Regarding Growth of AlN, GaN and AlxGa1−xN Thin Films via OMVPE and Gas Source MBE
3. GaN grown on hydrogen plasma cleaned 6H‐SiC substrates
4. GaN thin films deposited via organometallic vapor phase epitaxy on α(6H)–SiC(0001) using high‐temperature monocrystalline AlN buffer layers
5. Growth and Doping of GaN Directly on 6H-SiC by MBE
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1. Microstructure of porous gallium nitride nanowall networks;Acta Materialia;2014-02
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3. Reduction of Defects in GaN Epitaxial Films Grown Heteroepitaxially on SiC;Materials Science Forum;2006-10
4. Impact of 4H– and 6H–SiC(0001) nitridation on Ga wetting layer development and GaN growth by molecular beam epitaxy;Applied Physics Letters;2006-07-10
5. Ion-beam-assisted molecular-beam epitaxy: a method to deposit gallium nitride films with high crystalline quality;Thin Solid Films;2004-06
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